University of Birmingham > Talks@bham > Metamaterials Research Group Seminars > Applications and integration of semiconductor-based Metasurfaces

Applications and integration of semiconductor-based Metasurfaces

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If you have a question about this talk, please contact Dr Miguel Navarro-Cia.

A new class of planar, wavelength-thick optical components exhibiting exceptional optical properties have emerged in recent years. These artificial interfaces, known as metasurfaces, rely on the scattering properties of the subwavelength structures patterned at interfaces to manipulate the wavefront of light in almost any desired manner1. To further develop this technology towards dynamic tuning, broadband applications and industrial production, new materials and new fabrication methods are required[2,3]. In this presentation, I will introduce basic design and fabrication methods of semiconductor-based metasurfaces and demonstrate exciting new monolithic integration of metasurfaces onto VCSE Ls under back-emitting configuration4. Our wafer-level nonintrusive approach addresses the issues of arbitrary shaping laser beams with programmable controllability for various laser beam shaping applications, see figure below. We will conclude this presentation by reporting a drastically new approach for orbital angular momentum (OAM) multiplexing holography based on the strong OAM selectivity of semiconductor-based metasurfaces [5]. We show that owing to mathematically orthogonal OAM modes without a topological charge limit, a large number of OAM -dependent information channels can therefore be multiplexed by a single meta-hologram with high spatial resolution. This demonstration holds great promise for ultrahigh-capacity holographic devices and systems. Finally, for CNRS 80 years birthday, we had fun in the lab and realized a beautiful metasurface hologram depicting the 80 years CNRS logo, watch-out!

This talk is part of the Metamaterials Research Group Seminars series.

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